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NANO-IMPRINTER

LED, OLED, LCD, BIO등 여러 분야에서 NANO PATTERN의 필요성이 증가하고 있습니다. 하지만 반도체산업 이외에는 Photo Lithography 장비(KrF, ArF)를 도입하여 Nano Pattern을 만들기에는 장치가격, 품질, 생산성 측면에서 적합하지 않습니다. 기가레인은 수년간 Imprinter 기술을 개발했으며 이를 더욱 첨단화하여 Master Mold부터 생산Mold의 제작 및 공정 wafer상 imprint 진행까지 전자동으로 수행 할 수 있는 제품 서비스를 제공하고 있습니다. 또한 자체 청정실에서 품질관리하에 생산 Mold의 제작 및 wafer imprint 공정을 위탁 진행함으로써 고품질 뿐만 아니라 고생산성을 고객에게 제공하고 있습니다.
Features
Imprint 공정에 따른 다양한 model line up 제공
Imprinting
Process
장비 구성
Full Automated
Imprinter
Mold
Imprinter
Auto
Imprinter
Manual
Imprinter
Gigalane
NANO-IMPRINTER
CITUS 6000FA
Fully automatic Imprinter
Overview
&
Performance
  • - 4" ~ 6" wafer imprinting
  • - Sub-100nm pattern resolution (Comparable with KrF scanner)
  • - Fully automatic operation : Master mold → mold → imprint, no operator intervention
  • - System integration, CITUS6000M(mold imprinter) + 6000R(wafer imprinter), in-line opertation
  • - Easy job change(flexible pattern change while operation)
    variours master wafers can be loaded without any delay or loss during master change
  • - Master mold loading : 12" ~ 8" wafer(cassette loading)
  • - Motion monitoring systerm : Coating, imprintinig, wafer delivery, film moving, on-line CAM record
  • - Resin mold repeatable (multiple usage) : Gaseous release coater in-line
  • - Lower CoC & CoO : cost of consumable, cost of ownership
  • - Very small footprint & simple process against photo stepper & wet(coating, developing)
  • - LED, Display, Other Electric Devices
    PSS, Micro Lens Array, 3D structure, slanted structure and nano~micro scale patterning
  • - Nomial monthly capacity : 30K/month, 60 wph(wafer per hour)
Gigalane
NANO-IMPRINTER
CITUS 6000M for Mold CITUS 6000R CITUS 6000SA
Mold Imprinter Auto Imprinter Manual Imprinter
Overview
  • - Master mold : 6inch ~ 12inch
  • - Resin mold roll production
  • - In-line Resin Coating
    (spray, ink jet, u-dispenser)
  • - Roll to Plate Contact imprint
  • - UV imprint(365nm)
  • - 4inch ~ 6inch
  • - LED, Display, Optical Devices
  • - Flexible Resin Mold(Roll to Roll)
  • - In-line Coater(spin coater)
  • - In-line Gaeous release treatment
  • - Vacuum assisted UV imprint(365nm)
  • - 4inch ~ 6inch, Manual type
  • - LED, Display, Optical Devices
  • - Flexible Resin Mold
  • - Coater/Demold optional
  • - Vacuum assisted UV imprint(365nm)
Performance
  • - 20nm Pattern Resolution
  • - Lower CoC & CoO
  • - Monthly Capa. : 30K
  • - Direct mold fabrication from
    master mold
  • - 20nm Pattern Resolution
  • - Lower CoC & CoO
  • - Small footprint against photo Litho
  • - Comparable to KrF, i-line Stepper
  • - Monthly Capa. : 30K
  • - 20nm Pattern Resolution
  • - Long life time sheet type mold
  • - Easy loading / unloading
  • - Easy job Change(Mold change)
  • - R&D for WGP, nPSS, Fine nano pattern
Process Data
Nano pattern :
WGP
Nano pattern :
pillar array
Micro pattern :
hole array
Micro lens array :
Si wafer
Micro trench line
Various imprinted
patterns
Product